

Type of Document Dissertation Author Mitra, Arijit Author's Email Address amitra@vt.edu URN etd-05122008-150550 Title Silica dissolution at low pH in the presence and absence of fluoride Degree PhD Department Geosciences Advisory Committee
Advisor Name Title Rimstidt, james Donald Committee Chair Chermak, John A. Committee Member Dove, Patricia M. Committee Member Schreiber, Madeline E. Committee Member Keywords
- dissolution kinetics
- dissolution rate
- quartz
- hydrofluoric acid
- silica
- low pH
Date of Defense 2008-04-29 Availability unrestricted Abstract
SiO2
is the most abundant oxide in the earth and its properties, behaviors and
interactions are of immense scientific and technological importance. Of
particular importance are the interactions of silica with aqueous fluids
because these fluids are present in nearly every natural setting. The
dissolution of silica and glass by HF plays a very important role in technology
and is widely used for the etching of silica and silicate glasses in the glass
industry, in the flint industry, in surface micromachining, in etching of glass
fibers for near-field optical probes, in the creation of frosted surfaces for
decorative applications like frosted glass and cosmetic vials.
I
performed 57 batch reactor experiments in acidic fluoride solutions to measure
the dissolution rate of quartz. Quartz dissolution rate data from other
published studies were combined with the rate data from my experiments and these
75 data were analyzed using multiple linear regression
to produce an empirical rate law for quartz
rqz = 10-4.53
(e-18932/RT) aHF1.18 aH+-0.39
where
-5.13 < aHF < 1.60, -0.28
< pH < 7.18, and 25 < style='mso-bidi-font-style:normal'>T < 100 °C.
Similarly,
97 amorphous silica dissolution rate data from published studies were analyzed
using multiple linear regression to develop an
empirical rate law for amorphous silica
ras = 100.48
(e-34243/RT) aHF1.50 aH+-0.46
where
-5.13 < aHF < 1.60, -0.28
< pH < 7.18 and 25 < style='mso-bidi-font-style:normal'>T < 70 °C.
An
examination of the empirical rate laws suggests that the rate-determining step
in the reaction mechanism involves a coordinated attack of HF and H+
on the Si-O bond where the H+ ion, acting as a Lewis acid, attacks
the bridging O atom, while the F end of a HF molecule, acting as a Lewis base,
attacks the Si atom. This allows a redistribution of electrons from the Si-O
bond to form a O-H and a Si-FH bond, thus “breaking”
the Si-O bond.
In
order to quantify the effect of fluoride on the dissolution of silica, I also
performed a series of 81 quartz dissolution and 20 amorphous silica dissolution
experiments in batch reactors over a pH range of 0 to 7 to investigate the
effect of H+ on silica dissolution rates. Between pH 3.5 and 7 silica
dissolution rates are independent of pH, but they increase significantly below
pH 3.5, so that the dissolution rate of both quartz and amorphous silica at pH
0 is more than an order magnitude faster than the dissolution rate at pH 3.5. I
found that the empirical rate law for the dissolution of the “disturbed
surface” of quartz in the pH range of 0 to 3.5 is
rqz,pH = 10-0.23
(e-59392/RT) aH+0.28
where 0 < pH < 3.5 and 25 < T < 55°C. The
empirical rate law for amorphous silica dissolution in the pH range 0 to 3.5 is
rqz,pH = 100.56
(e-64754/RT) aH+0.40
where 0
< pH < 3.5 and 25 < T < 55°C.
Based
on the empirical rate laws I suggest that the rate-determining step in the
reaction mechanism involves a coordinated attack of H3O+,
acting as a Lewis acid reacts, on a bridging O atom and the O end of a H2O,
acting as a Lewis base, on the Si atom. This results in a redistribution of
electrons from the Si-O bridging bond to form two Si-OH surface species.
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