Title page for ETD etd-05132011-091839


Type of Document Master's Thesis
Author Waller, Gordon Henry
URN etd-05132011-091839
Title Template Directed Growth of Nb doped SrTiO3 using Pulsed Laser Deposition
Degree Master of Science
Department Materials Science and Engineering
Advisory Committee
Advisor Name Title
Abiade, Jeremiah T. Committee Chair
Lu, Guo-Quan Committee Member
Lu, P. Kathy Committee Member
Keywords
  • Pulsed Laser Deposition
  • Electron Beam Lithography
  • Oxide nano-patterning
Date of Defense 2011-04-29
Availability unrestricted
Abstract
Oxide materials display a wide range of physical properties. Recently, doped complex

oxides have drawn considerable attention for various applications including thermoelectrics.

Doped complex oxide materials have high Seebeck coefficients (S) and electrical conductivities

(o) comparable to other doped semiconductors but low thermoelectric figure of merit ZT values

due to their poor thermal conductivities. For example, niobium doped strontium titanate

(SrNbxTi1-xO3 or simply Nb:STO) has a power factor comparable to that of bismuth telluride.

Semiconductor nanostructures have demonstrated a decrease in thermal conductivity () resulting in an increase in the thermoelectric figure of merit (ZT). Nanostructures of doped oxides like niobium doped strontium titanate, may also lead to decreased  and a corresponding increase in ZT. The major impediment to nanostructured oxide thermoelectric materials is the lack of suitable fabrication techniques for testing and eventual use. Electron Beam Lithography(EBL) was used to pattern poly-methyl-methacrylate (PMMA) resists on undoped single crystalline SrTiO3 (STO) substrates which were then filled with Nb:STO using Pulsed Laser Deposition (PLD) at room temperature. This technique produced nanowires and nanodots with critical dimensions below 100 nm, and a yield of approximately 95%. In addition to scanning electron microscopy and atomic force microscopy morphological studies of the patterned oxide, thin film analogues were used to study composition, crystallinity and electrical conductivity of the material in response to a post deposition heat treatment. Since the thin films were grown under similar experimental parameters as the oxide nanostructres, the patterned oxides are believed to be stoichiometric and highly crystalline. The study found that using a combination of EBL and PLD, it is possible to produce highly crystalline, doped complex oxide nanostructures with excellent control over morphology. Furthermore, the technique is applicable to nearly all materials and provides the capability of patterning doped oxide materials without the requirement of etching or multiple lithography steps makes this approach especially interesting for future fundamental materials research and novel device fabrication.

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