Type of Document	Dissertation
Author	Muthukrishnan, N. Moorthy
URN	etd-06062008-151045
Title	Characterization and modeling of dry etch processes for titanium nitride and titanium films in C2/N2 and BCl3 plasmas
Degree	PhD
Department	Electrical Engineering
Advisory Committee	Advisor Name Title Elshabini-Riad, Aicha A. Committee Chair Ameriadis, Kostas Committee Member Farkas, Diana Committee Member Su, Wansheng Committee Member Wang, Anbo Committee Member
Keywords	titanium plasma etch titanium nitride response surface methodology chlorine boron trichloride
Date of Defense	1996-11-04
Availability	restricted
Abstract Not available until OCRd
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