Title page for ETD etd-06062008-151045


Type of Document Dissertation
Author Muthukrishnan, N. Moorthy
URN etd-06062008-151045
Title Characterization and modeling of dry etch processes for titanium nitride and titanium films in C2/N2 and BCl3 plasmas
Degree PhD
Department Electrical Engineering
Advisory Committee
Advisor Name Title
Elshabini-Riad, Aicha A. Committee Chair
Ameriadis, Kostas Committee Member
Farkas, Diana Committee Member
Su, Wansheng Committee Member
Wang, Anbo Committee Member
Keywords
  • titanium
  • plasma etch
  • titanium nitride
  • response surface methodology
  • chlorine
  • boron trichloride
Date of Defense 1996-11-04
Availability restricted
Abstract
Not available until OCRd
Files
  Filename       Size       Approximate Download Time (Hours:Minutes:Seconds) 
 
 28.8 Modem   56K Modem   ISDN (64 Kb)   ISDN (128 Kb)   Higher-speed Access 
[VT] LD5655.V856_1996.M884.pdf 6.88 Mb 00:31:50 00:16:22 00:14:19 00:07:09 00:00:36
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