Title page for ETD etd-10202005-102831
|Type of Document
||Ion assisted deposition of multicomponent thin films
||Materials Engineering Science
|No Advisors Found
|Date of Defense
A novel in-situ stress measurement technique to study the formation kinetics
of multi component oxide thin films was developed and was applied to PbTiO3.
Single phase PbTi 03 thin films were formed from the reaction between films in the
deposited PbO ITi02 multilayer. The film stoichiometry was accurately controlled
by depositing individual layers of the required thickness. Development of film
stresses associated with the formation of the product layer at the PbO/Ti02
interface of the multilayers was used to monitor growth rate of the PbTiO3 layer.
It was found that growth of the PbTiO3 phase obeyed the parabolic law and the
effective activation energy was estimated to be 108 kJ/mole. It is believed that the
mechanism of this reaction was dominated by grain boundary diffusion of the
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